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GEMINI ALD SYSTEM
PEALD 系统设备 GEMINI ALD SYSTEM - 应用于淀积 ALD氧化(Oxide)薄膜，氮化硅(SiN)薄膜等多种薄膜 为多图案应用提供高质量保真和非常均匀的薄膜解决方案， 在形成多个图案化膜 (例如SADP和SAQP)时的沉积过程起到关键作用 凭借其小尺寸，性能优于许多具有高UPEH和极端均匀性控制的竞争对手 提供各种旋钮，用于地图轮廓控制和简单的温度变化过程，无需任何硬件修改 具有优异的薄膜均匀性、高吞吐量，产能高和卓越的阶梯覆盖率
Process
-ALD Oxide
-SiN _ Ternary oxide
Applications
- Patterning (Spacer for SADP/QP)
- Hardmask
- Liner
- Gap fill
Introduction.Deposition process in forming multiple patterning films such as SADP and SAQP plays a key role as it defines critical dimensions.GEMINI ALD SYSTEM provides solution for multi-patterning applications with high-quality conformal and very uniform films.
With its small foot print it outperforms many of its competitor models with high UPEH and extreme uniformity control.It also provides various knobs for map profile control and easy process temperature changes without hardware modifications.
Technology.High etch selectivity, smooth film surface, adjustable film stress are controled by composition rate .
Features.
1. Carefully designed chamber, swappable process kits and pumping system for minimal defect and easy maintenance.
2. Edge and backside control by edge flow and vacuum chucking system: Less edge defect and more DOF margin.
